The samples we recently showcased at our Future Summits conference will soon be presented in two upcoming conferences. With these samples we illustrate how costly standard CMOS processes can be simplified with much fewer process steps using nanoimprint lithography. We benchmark both samples side by side for optical performance for multispectral imaging applications.
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The paper “Highly Selective Color Filters Based on Hybrid Plasmonic-Dielectric Nanostructures” by Anabel De Proft just got published in ACS Photonics. In this work that’s part of her Ph.D. research we demonstrate hybrid plasmonic-dielectric color filters that can be applied for multispectral imaging applications. The filters show narrow linewidths down to 25 nm FWHM with transmission intensities over 50% that nearly cover the full visible spectrum. These filters are among the most efficient plasmonic color filters reported to date, a surprising result considering that in top-view there’s a 100% metal coverage. And we all love metal, don’t we?!
The publications page was updated to include some works that were missing. All publications that could be shared according to the terms of the publishers were also added as PDF files for downloading.